Proceedings from this workshop are available for ordering.
SEMATECH and ISMI members can access these conference proceedings at no charge on the SEMATECH Member Site.
Agenda |
|
| Keynote | Oscilowski (SEMATECH) |
| International Technology Roadmap for Semiconductors - Front End Processes Overview | Butterbaugh (ITRS) |
| Characterization and Damage-Free Cleaning of FinFET Structures | Lauerhaas (FSI) |
| A Novel Chemical Oxide Removal Process to Meet Current and Future Surface Preparation Challenges | Brown (TEL) |
| Recent Advances in the Electrohydrodynamic (EHD) Cleaning Process | Finster (EHD Technology Group) |
| Single Wafer Wet Cleaning Performance and Particle Removal > 36 nm | Sano (DNS) |
| Single Wafer Immersion Processing for sub 65nm FEOL Critical Cleans | Rosato (AMAT) |
| Development of SiGe Cleaning Solutio Using Dilute SC1 | Mun (Samsung) |
| Photomask Resist Removal and Cleaning with Sulfur-free Chemistry and Damage-Free Cleaning Technology | Gouk (AMAT) |
| Ash-Free, Wet Stripping of Heavily Implanted Photoresist | Butterbaugh (FSI) |
| A Novel Photoreactive Surface Processing System | Elliott (UVTech Systems) |
| A Study of Resist Removal and Damage in Non-Ashing High Dose Implant Strip | Banerjee (Eco-Snow Systems ) |
Return to Past Meetings
Copyright 2009, SEMATECH Inc.
Privacy Policy | Trademark and Legal Notices