5th International Symposium on Immersion Lithography Extensions
September 22-25, 2008
The Hague, Netherlands
Now in its fifth year, this symposium continues to focus on the progress in 193 nm high-index immersion lithography and other extensions to optical lithography, and to build consensus on how the industry will address emerging critical issues.
The purpose of this symposium is to serve as a forum for the exchange of ideas and best practices between researchers and practitioners from around the world.
IMEC, in cooperation with SEMATECH and Selete, will host this year’s symposium.
Symposium Updates
- Online registration is now open. See the Registration Details for more information.
- See who's speaking at the Symposium. A detailed meeting agenda is available on the Program Information page.
- Symposium organizers have prepared sightseeing tours to Amsterdam and The Hague for attendees and their accompanying guests. See the Registration Details for more information.
