5th International Symposium on Advanced Gate Stack Technology
September 29–October 1, 2008
Austin, Texas
The 5th International Symposium on Advanced Gate Stack Technology is a forum for researchers from semiconductor industry and universities to discuss current technical challenges in advanced gate stack technology through panel discussions, invited and contributed presentations.
This three-day symposium—jointly hosted by SEMATECH, IEEE, and UT Dallas—is intended to build enhanced industry consensus on the strategy towards solutions for high-k/metal gate stack implementation in 32nm technology node and beyond.
The Symposium welcoming reception and registration check-in will take place Sunday, September 28 from 6:00pm - 8:30pm.
Symposium Updates
- Symposium organizers have made arrangements for optional recreational activities for symposium attendees on their guests on Tuesday, September 30. Find out more about these events.
