SEMATECH News

09 Sep 08

SEMATECH Recognized for Research on High-k Metal Gates at SSDM 2008; Technologists report on New Materials and Device Structures

09 Sep 08

SEMATECH Names Veteran Technologists to Lead Lithography Division

08 Sep 08

ISMI's 20th Annual AEC/APC Symposium to Focus on Manufacturing Solutions for Factory Productivity Improvement

28 Aug 08

ISMI Manufacturing Symposium Keynotes to Focus on Best Practices and Business Strategies that Shape Manufacturing Growth

20 Aug 08

SEMATECH President and CEO Featured Speaker at SEMICON Taiwan 2008

18 Aug 08

Experts to address critical challenges for introduction of 3D IC products at SEMATECH 3D IC Workshop on Manufacturing and Reliability Sept. 25-26

12 Aug 08

SEMATECH Engineers and Resist Suppliers Demonstrate CAR Platforms Supporting 22 nm Introduction

28 Jul 08

UMC Joins SEMATECH Research Consortium

24 Jul 08

SEMATECH Announces Expanded Roles for Key Executives

22 Jul 08

Technologists Assess 3D Interconnect Technologies and Equipment Readiness at SEMATECH Workshop during SEMICON West

08 Jul 08

SEMATECH Announces Speaker Lineup for SEMICON West

19 Jun 08

SEMATECH Technologists Report on Enabling Results in the Areas of New Materials for Advanced High Mobility Channels and High-k Metal Gates

02 Jun 08

Registration Opens for ISMI Manufacturing Week Scheduled for October 20-23

22 May 08

Global Experts Support 193 nm Double Patterning Immersion and EUV as Next-Generation Lithography

06 May 08

ISMI provides “Golden Reference” for Recipe and Parameter Management Implementation

23 Apr 08

SEMATECH’S Litho Forum Spotlights High-Stakes Shift to Next-Generation Manufacturing

21 Apr 08

SEMATECH Researchers Demonstrate High-k Metal Gates for 22 nm Node and Advancements Resulting in Practical FinFETs and High Mobility Ge Channels

26 Mar 08

SEMATECH Lithography Forum to Focus on Major Technology Shift

27 Feb 08

Accretech Joins SEMATECH’s 3D Interconnect Program at UAlbany NanoCollege

25 Feb 08

Carl Zeiss and SEMATECH Develop Novel Design for Photomask Registration and Overlay Metrology to Enable Double-Patterning Lithography

21 Feb 08

SEMATECH and ISMI to Focus on Manufacturability at SPIE

20 Feb 08

Rudolph Joins Leading Chipmakers in SEMATECH’s Metrology Program at UAlbany NanoCollege

11 Feb 08

SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal

22 Jan 08

SEMATECH Announces 2008 SEMATECH Knowledge Series

15 Jan 08

ISMI Introduces Guidelines to Protect IP in Semiconductor Industry